微技术领域中,光罩检测(英语:mask inspection)是检查光罩制作正确性的操作技术[1]。用于定位光罩缺陷的是高级自动化系统,如扫描电子显微镜[2]。“光罩检测”一词也可能非正式地指称真正写入光罩前的光罩资料检测mask data inspection[3]

半导体光罩

参考文献

编辑
  1. ^ "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3-540-12558-2, Chapter 4: "Mask Inspection Technology"
  2. ^ ZEISS Webpage offering automated mask repair tools
  3. ^ "Design for manufacturability and yield for nano-scale CMOS", by Charles Chiang, Jamil Kawa, 2007, ISBN 1-4020-5187-5, p. 237